This section covers some of the controls that are common between local and remote repositories.
Snapshots and Releases Handling Policy
You can configure whether a local or remote repository handles snapshots and/or release artifacts.
Include and Exclude Patterns
It is extremely important to use include and exclude patterns for repositories. This is especially important for remote repositories in order to:
Include and exclude filtering is controlled by editing the Includes Pattern and Excludes Pattern values for a repository (Admin:General:Reposiories:edit a repository). Specify a comma separated list list of Ant-like patterns to filter-in and filter-out artifact queries. Filtering works by subtracting the excluded patterns (default is none) from the included ones (defaults to everything). for example:
Will cause Artifactory to submit queries to the repository in question for
Centrally Controlled Unique Snapshot Policy
One of the unique features of Artifactory is you can gain centralized control on how snapshots are be deployed into a repository, regardless of end user-specific settings. This can guarantee standardized format for deployed snapshots within your organization.
Cleaning-up Unique Snapshots
We strongly recommend using non-unique snapshots (why?). However, putting aside the question of usefulness in using unique snapshots, you can tell Artifactory to automatically clean up old unique snapshots by setting the repository's Max Unique Snapshots value to the maximum number of unique snapshots of an artifact that should be maintained in the repository. Clean up takes effect on each new snapshot deployment.
It is possible, if desired for whatever reasons, to completely black-out a repository by marking its "Blacked Out" flag, making it effectively disabled. A blacked-out repository does not participate in any artifacts resolution and artifacts cannot be downloaded from it or deployed to it.